共 50 条
- [1] CHEMICAL VAPOR-DEPOSITION OF METALS FOR INTEGRATED-CIRCUIT APPLICATIONSJOURNAL OF METALS, 1985, 37 (08): : A12 - A12GREEN, ML
- [2] APPLICATIONS FOR LASER CHEMICAL VAPOR-DEPOSITIONJOURNAL OF THE OPTICAL SOCIETY OF AMERICA, 1979, 69 (10) : 1461 - 1461ALLEN, SD
- [3] THE PRINCIPLES AND APPLICATIONS OF CHEMICAL VAPOR-DEPOSITIONTRANSACTIONS OF THE INSTITUTE OF METAL FINISHING, 1992, 70 : 68 - 75KEMPSTER, A
- [4] LASER CHEMICAL VAPOR-DEPOSITION OF METALS AND INSULATORSJOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (02): : 431 - 431ALLEN, SDBASS, M
- [5] LASER CHEMICAL VAPOR-DEPOSITION OF METALS AND INSULATORSIEEE JOURNAL OF QUANTUM ELECTRONICS, 1979, 15 (09) : D43 - D44ALLEN, SD
- [6] A MULTICHAMBER SINGLE-WAFER CHEMICAL VAPOR-DEPOSITION REACTOR AND ELECTRON-CYCLOTRON RESONANCE PLASMA FOR FLEXIBLE INTEGRATED-CIRCUIT MANUFACTURINGJOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1991, 9 (02): : 374 - 379ZHOU, ZHYU, FZREIF, R
- [7] ATMOSPHERIC-PRESSURE CHEMICAL-VAPOR-DEPOSITION OF BLANKET TUNGSTEN FILMS ON SILICON SUBSTRATES FOR INTEGRATED-CIRCUIT APPLICATIONSJOURNAL OF ELECTRONIC MATERIALS, 1995, 24 (06) : 761 - 766HAQUE, MSPATEL, UVNASEEM, HABROWN, WD
- [8] CHEMICAL VAPOR-DEPOSITION AND PHYSICAL VAPOR-DEPOSITION COATINGS - PROPERTIES, TRIBOLOGICAL BEHAVIOR, AND APPLICATIONSJOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1986, 4 (06): : 2832 - 2843HABIG, KH
- [9] PRINCIPLES AND APPLICATIONS OF CHEMICAL VAPOR-DEPOSITION (CVD)PURE AND APPLIED CHEMISTRY, 1982, 54 (07) : 1297 - 1311SPEAR, KE
- [10] CHEMICAL VAPOR-DEPOSITION APPLICATIONS IN MICROELECTRONICS PROCESSINGTHIN SOLID FILMS, 1981, 83 (02) : 173 - 186BEAN, KE