ELECTRON-TRANSPORT THROUGH ANTIDOT SUPERLATTICES IN SI/SI0.7GE0.3 HETEROSTRUCTURES

被引:19
作者
TOBBEN, D
HOLZMANN, M
KUHN, S
LORENZ, H
ABSTREITER, G
KOTTHAUS, JP
SCHAFFLER, F
机构
[1] UNIV MUNICH,SEKT PHYS,D-80539 MUNICH,GERMANY
[2] DAIMLER BENZ AG,FORSCHUNGSINST ULM,D-89081 ULM,GERMANY
来源
PHYSICAL REVIEW B | 1994年 / 50卷 / 12期
关键词
D O I
10.1103/PhysRevB.50.8853
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Transport properties of electrons in antidot superlattices are studied in Si/Ge heterostructures. Lateral superlattices with periods between 830 and 500 nm were imposed upon high-mobility two-dimensional electron gases in Si/Si0.7Ge0.3 heterostructures by means of laser holography and reactive ion etching. Typical features known from GaAs/AlxGa1-xAs samples, such as low-field commensurability oscillations in the longitudinal resistivity rho(xx), additional nonquantized Hall plateaus, and quenching of the Hall effect around B = 0, are observed. From the position of the commensurability maxima in rho(xx) we conclude that the lateral potential is rather smooth.
引用
收藏
页码:8853 / 8856
页数:4
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