SELF-ALIGNED TI SILICIDE FORMED BY RAPID THERMAL ANNEALING

被引：36
作者：
BRAT, T
OSBURN, CM
FINSTAD, T
LIU, J
ELLINGTON, B
机构：
[1] MICROELECTR CTR N CAROLINA, RES TRIANGLE PK, NC 27709 USA
[2] N CAROLINA STATE UNIV, DEPT PHYS, RALEIGH, NC 27695 USA
[3] N CAROLINA STATE UNIV, RALEIGH, NC 27695 USA
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1986年 / 133卷 / 07期
关键词：
D O I：
10.1149/1.2108933
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
引用
收藏
页码：1451 / 1458
页数：8
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