VARIABLE ENERGY-GAP IN OXYGENATED AMORPHOUS CADMIUM TELLURIDE

被引:17
作者
ESPINOZABELTRAN, FJ
SANCHEZSINENCIO, F
ZELAYAANGEL, O
MENDOZAALVAREZ, JG
ALEJOARMENTA, C
VAZQUEZLOPEZ, C
FARIAS, MH
SOTO, G
COTAARAIZA, L
PENA, JL
AZAMARBARRIOS, JA
BANOS, L
机构
[1] UNIV AVTOMA PUEBLA, INST FIS, PUEBLA 72570, MEXICO
[2] IFUNAM, LAB ENSENADA, BAJA CALIFORNIA 2681, MEXICO
[3] CINVESTAV IPN, UNIDAD MERIDA, MERIDA, MEXICO
[4] NATL AUTONOMOUS UNIV MEXICO, INST INV MAT, MEXICO CITY 04510, DF, MEXICO
[5] UNIV SONORA, CIF, HERMOSILLO, SONORA, MEXICO
[6] UNIV AVTONOMA SINALOA, ECFM, CULIACAN, SINALOA, MEXICO
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS | 1991年 / 30卷 / 10A期
关键词
SEMICONDUCTORS; OPTICAL PROPERTIES; THIN FILMS; AMORPHOUS SEMICONDUCTORS; PHOTOVOLTAIC MATERIALS;
D O I
10.1143/JJAP.30.L1715
中图分类号
O59 [应用物理学];
学科分类号
摘要
A new material, oxygenated amorphous cadmium telluride, is introduced into the II-VI semiconductor compounds family. Amorphous films of this material have been grown by a radio frequency sputtering deposition technique, using a controlled plasma (Ar-O-N) on glass slides substrates positively dc biased. We show that the bandgap of the films can be changed in a controlled way in the range from 1.48 to 2.02 eV depending on the amount of oxygen present in the sample.
引用
收藏
页码:L1715 / L1717
页数:3
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