DESIGN AND VERIFICATION OF NEARLY IDEAL FLOW AND HEAT-TRANSFER IN A ROTATING-DISK CHEMICAL VAPOR-DEPOSITION REACTOR

A research chemical vapor deposition reactor design is presented for a rotating disk configuration. The reactor can be operated under conditions such that nearly ideal, one-dimensional, infinite-radius disk behavior is achieved over most of the disk surface. Boundary conditions, flow stability under both isothermal and heated-disk conditions, and gas temperatures are addressed with both one- and two-dimensional numerical fluid mechanics models. Experimental verification of the design using flow visualization and laser Raman thermometry are presented.