X-RAY PHOTOELECTRON-SPECTROSCOPY OF THERMALLY TREATED SIO2 SURFACES

被引：130

作者：

MILLER, ML ^{[1
]}

LINTON, RW ^{[1
]}

机构：

[1] UNIV N CAROLINA,DEPT CHEM,CHAPEL HILL,NC 27514

来源：

ANALYTICAL CHEMISTRY | 1985年 / 57卷 / 12期

关键词：

D O I：

10.1021/ac00289a033

中图分类号：

O65 [分析化学];

学科分类号：

070302 ; 081704 ;

摘要：

引用

页码：2314 / 2319

页数：6

共 31 条

[1] AN XPS STUDY OF SI AS IT OCCURS IN ADSORBENTS, CATALYSTS, AND THIN-FILMS [J].

BARR, TL .

APPLIED SURFACE SCIENCE, 1983, 15 (1-4) :1-35

[2] ESCA STUDY OF TERMINATION OF PASSIVATION OF ELEMENTAL METALS [J].

BARR, TL .

JOURNAL OF PHYSICAL CHEMISTRY, 1978, 82 (16) :1801-1810

[3]

FUGLE JC, 1975, SURF SCI, V49, P61

[4] QUANTITATIVE COMPARISON OF DIRECT AND DERIVATIVE AES WITH XPS OF METAL SULFIDES [J].

GRIFFIS, DP ;

LINTON, RW .

SURFACE AND INTERFACE ANALYSIS, 1982, 4 (05) :197-203

[5] MICROCOMPUTER APPROACH TO ELEMENTAL DEPTH PROFILING WITH AUGER-ELECTRON SPECTROMETRY [J].

GRIFFIS, DP ;

WOODWARD, WS ;

LINTON, RW .

ANALYTICAL CHEMISTRY, 1981, 53 (14) :2377-2379

[6] CHEMICAL CHARACTERIZATION OF HYDROUS FERRIC OXIDES BY X-RAY PHOTOELECTRON-SPECTROSCOPY [J].

HARVEY, DT ;

LINTON, RW .

ANALYTICAL CHEMISTRY, 1981, 53 (11) :1684-1688

[7] BEHAVIOR OF WATER CONTAINING MATERIALS IN THE HIGH-VACUUM OF AN X-RAY PHOTOELECTRON SPECTROMETER [J].

HIROKAWA, K ;

DANZAKI, Y .

SURFACE AND INTERFACE ANALYSIS, 1982, 4 (02) :63-67

[8]

Iler R. K., 1955, COLLOID CHEM SILICA, Vvol. 80

[9] SI-SIO2 INTERFACE CHARACTERIZATION BY ESCA [J].

ISHIZAKA, A ;

IWATA, S ;

KAMIGAKI, Y .

SURFACE SCIENCE, 1979, 84 (02) :355-374

[10] SURFACE FUNCTIONALITY OF AMORPHOUS SILICA BY INFRARED SPECTROSCOPY [J].

MCDONALD, RS .

JOURNAL OF PHYSICAL CHEMISTRY, 1958, 62 (10) :1168-1178

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