ELLIPSOMETRIC STUDY OF ETCHING OF GALLIUM-ARSENIDE SURFACE

被引：0

作者：

ROGOVSKII, PV

EGOROV, AL

EZHOVSKII, YK

机构：

来源：

JOURNAL OF APPLIED CHEMISTRY OF THE USSR | 1984年 / 57卷 / 09期

关键词：

D O I：

暂无

中图分类号：

O69 [应用化学];

学科分类号：

081704 ;

摘要：

引用

页码：1969 / 1971

页数：3

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[31] INFRARED CHARACTERIZATION OF AN EPITAXIAL FILM OF GALLIUM-ARSENIDE ON A GALLIUM-ARSENIDE SUBSTRATE
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