INFLUENCE OF FLOATING SUBSTRATE POTENTIAL ON CHARACTERISTICS OF ESFI MOS-TRANSISTORS

被引:61
作者
TIHANYI, J [1 ]
SCHLOTTERER, H [1 ]
机构
[1] SIEMENS AG,RES LABS,MUNICH,FED REP GER
关键词
D O I
10.1016/0038-1101(75)90083-0
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:309 / 314
页数:6
相关论文
共 7 条
[1]  
DENNARD RH, 1973, INT ELECTRON DEVICES
[2]  
HSU ST, 1973, INT ELECTRON DEVICES
[3]  
KENNEDY DP, 1974, INT SOLID ST CIRCUIT
[4]  
LONGO HE, 1970, Z ANGEW PHYSIK, V29, P166
[5]   AVALANCHE BREAKDOWN IN SILICON [J].
MCKAY, KG .
PHYSICAL REVIEW, 1954, 94 (04) :877-884
[6]  
SCHLOTTERER H, 1969, ELECTRONICS-US, V42, P113
[7]  
TIHANYI J, 1973, SIEMENS INTERNAL RES