A VERY HIGH-SENSITIVITY PHOTOTRANSISTOR STRUCTURE

被引:3
作者
NISHIZAWA, J [1 ]
NONAKA, K [1 ]
TAMAMUSHI, T [1 ]
机构
[1] SEMICOND RES INST,KAWAUCHI,SENDAI 980,JAPAN
来源
INTERNATIONAL JOURNAL OF INFRARED AND MILLIMETER WAVES | 1985年 / 6卷 / 08期
关键词
D O I
10.1007/BF01011944
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
27
引用
收藏
页码:649 / 673
页数:25
相关论文
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