IMPORTANCE OF COULOMB CORRELATION IN SILICIDE SPECTRA

被引：6

作者：

CALANDRA, C

BISI, O

DELPENNINO, U

VALERI, S

XI, Y

机构：

来源：

SURFACE SCIENCE | 1986年 / 168卷 / 1-3期

关键词：

D O I：

10.1016/0039-6028(86)90847-2

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

引用

页码：164 / 170

页数：7

共 19 条

[1]

AITELHABTI D, 1984, J PHYS F MET PHYS, V14, P1317, DOI 10.1088/0305-4608/14/5/026

[2] ELECTRONIC-STRUCTURE AND PROPERTIES OF NI-SI(001) AND NI-SI(111) REACTIVE INTERFACES [J].

BISI, O ;

CHIAO, LW ;

TU, KN .

PHYSICAL REVIEW B, 1984, 30 (08) :4664-4674

[3] CORRELATION-EFFECTS IN VALENCE-BAND SPECTRA OF NICKEL SILICIDES [J].

BISI, O ;

CALANDRA, C ;

DELPENNINO, U ;

SASSAROLI, P ;

VALERI, S .

PHYSICAL REVIEW B, 1984, 30 (10) :5696-5703

[4] ATOMIC INTERMIXING AND ELECTRONIC INTERACTION AT THE PD-SI(111) INTERFACE [J].

BISI, O ;

TU, KN .

PHYSICAL REVIEW LETTERS, 1984, 52 (18) :1633-1636

[5] SELF-CONSISTENT ENERGY-BANDS AND BONDING OF NI3SI [J].

BYLANDER, DM ;

KLEINMAN, L ;

MEDNICK, K .

PHYSICAL REVIEW B, 1982, 25 (02) :1090-1095

[6]

CALANDRA C, 1985, SURFACE SCI REPT, V4, P4271

[7] PHOTOEMISSION AND BAND-STRUCTURE RESULTS FOR NISI-2 [J].

CHABAL, YJ ;

HAMANN, DR ;

ROWE, JE ;

SCHLUTER, M .

PHYSICAL REVIEW B, 1982, 25 (12) :7598-7602

[8] CHEMICAL BONDING AT THE SI-METAL INTERFACE - SI-NI AND SI-CR [J].

FRANCIOSI, A ;

WEAVER, JH ;

ONEILL, DG ;

CHABAL, Y ;

ROWE, JE ;

POATE, JM ;

BISI, O ;

CALANDRA, C .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1982, 21 (02) :624-627

[9] ELECTRONIC-STRUCTURE OF CR SILICIDES AND SI-CR INTERFACE REACTIONS [J].

FRANCIOSI, A ;

WEAVER, JH ;

ONEILL, DG ;

SCHMIDT, FA ;

BISI, O ;

CALANDRA, C .

PHYSICAL REVIEW B, 1983, 28 (12) :7000-7008

[10] METAL-SILICON INTERFACE FORMATION - THE NI-SI AND PD-SI SYSTEMS [J].

GRUNTHANER, PJ ;

GRUNTHANER, FJ ;

MADHUKAR, A ;

MAYER, JW .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 19 (03) :649-656

← 1 2 →