N-INVERSION LAYERS ON OXIDIZED P-TYPE SILICON

被引:3
作者
LEUENBERGER, F
机构
来源
PROCEEDINGS OF THE INSTITUTE OF ELECTRICAL AND ELECTRONICS ENGINEERS | 1965年 / 53卷 / 11期
关键词
D O I
10.1109/PROC.1965.4380
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
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页码:1761 / +
页数:1
相关论文
共 3 条
[1]   IMPURITY REDISTRIBUTION AND JUNCTION FORMATION IN SILICON BY THERMAL OXIDATION [J].
ATALLA, MM ;
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[2]   DETAILED ANALYSIS OF THIN PHOSPHORUS-DIFFUSED LAYERS IN PARA-TYPE SILICON [J].
TANNENBAUM, E .
SOLID-STATE ELECTRONICS, 1961, 2 (2-3) :123-132
[3]   SPACE-CHARGE MODEL FOR SURFACE POTENTIAL SHIFTS IN SILICON PASSIVATED WITH THIN INSULATING LAYERS [J].
THOMAS, JE ;
YOUNG, DR .
IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1964, 8 (04) :368-+