ENHANCED CRYSTALLINITY OF LOW-TEMPERATURE-DEPOSITED SILICON FILMS ON GRAPHITE SUBSTRATES

被引：8
作者：
CHANG, CA
SIEKHAUS, WJ
机构：
[1] UNIV CALIF BERKELEY, LAWRENCE BERKELEY LAB,DIV MAT & MOLEC RES,BERKELEY,CA 94720
[2] UNIV CALIF BERKELEY, LAWRENCE BERKELEY LAB,DIV ENERGY & ENVIRONM,BERKELEY,CA 94720
来源：
APPLIED PHYSICS LETTERS | 1976年 / 29卷 / 03期
关键词：
D O I：
10.1063/1.88996
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：208 / 210
页数：3
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[2]   ENHANCED CRYSTALLINITY OF SILICON FILM DEPOSITED AT LOW-TEMPERATURE [J].
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