ON SIMULATION OF RESIST PROFILES IN ELECTRON-BEAM LITHOGRAPHY

被引：1
作者：
DESHMUKH, PR
RAJA, NKL
KHOKLE, WS
机构：
来源：
MICROELECTRONICS AND RELIABILITY | 1988年 / 28卷 / 02期
关键词：
D O I：
10.1016/0026-2714(88)90355-1
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
收藏
页码：223 / 228
页数：6
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