CHARGE TRANSPORT AND STORAGE IN ION-IMPLANTED METAL-OXIDE SEMICONDUCTOR STRUCTURES

被引：0
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作者：
AUGULIS, L
PRANEVICIUS, L
VOSYLIUS, J
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来源：
APPLICATIONS OF SURFACE SCIENCE | 1982年 / 10卷 / 03期
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D O I：
10.1016/0378-5963(82)90166-0
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页码：349 / 356
页数：8
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