CHARGE TRANSPORT AND STORAGE IN ION-IMPLANTED METAL-OXIDE SEMICONDUCTOR STRUCTURES

被引：0

作者：

AUGULIS, L

PRANEVICIUS, L

VOSYLIUS, J

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来源：

APPLICATIONS OF SURFACE SCIENCE | 1982年 / 10卷 / 03期

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D O I：

10.1016/0378-5963(82)90166-0

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摘要：

引用

页码：349 / 356

页数：8

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