PLASMA-ETCHING OF REFRACTORY-METALS (W, MO, TA) AND SILICON IN SF6 AND SF6-O2 - AN ANALYSIS OF THE REACTION-PRODUCTS

被引：79

作者：

PICARD, A

TURBAN, G

机构：

来源：

PLASMA CHEMISTRY AND PLASMA PROCESSING | 1985年 / 5卷 / 04期

关键词：

D O I：

10.1007/BF00566008

中图分类号：

TQ [化学工业];

学科分类号：

0817 ;

摘要：

引用

页码：333 / 351

页数：19

共 21 条

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