RESPUTTERING EFFECT ON Y1BA2CU3O7-D THIN-FILMS PREPARED BY RF-MAGNETRON SPUTTERING

被引：9
|
作者：
ENAMI, H [1 ]
SHINOHARA, T [1 ]
KAWAHARA, N [1 ]
KAWABATA, S [1 ]
HOSHIZAKI, H [1 ]
IMURA, T [1 ]
机构：
[1] AICHI INST TECHNOL,DEPT MECH ENGN,YAGUSA,TOYOTA 47003,JAPAN
来源：
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS | 1990年 / 29卷 / 05期
关键词：
Optical emission spectroscopy; Resputtering effect; Rf-magnetron sputtering; Superconductor Y1Ba2Cu307; Thin film;
D O I：
10.1143/JJAP.29.L782
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
Y1Ba2Cu3O7-δ thin films were prepared on MgO(001) substrates by rf-magnetron sputtering. The influence of oxygen partial pressure on film preparation has been investigated quantitatively. The oxygen flow rate near the substrate was controlled by an oxygen inlet ring. As-deposited films in an appropriate condition of oxygen flow rate show a superconducting transition at 83 K. When too much oxygen gas is introduced into a chamber, as-deposited films are damaged by resputtering and their superconducting property disappears. The growth mechanism of the thin films is discussed in terms of the resputtering effect. © 1990 The Japan Society of Applied Physics.
引用
收藏
页码：L782 / L784
页数：3
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