EFFECTS OF MAGNETIC-FIELD ON PLASMA CVD PROCESS

被引：0
|
作者：
FUJIYAMA, H [1 ]
YAMASHITA, T [1 ]
TAKAHASHI, T [1 ]
MATSUO, H [1 ]
机构：
[1] NAGASAKI UNIV,FAC ENGN,DEPT ELECT ENGN,NAGASAKI 852,JAPAN
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1987年 / 134卷 / 8B期
关键词：
D O I：
暂无
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
引用
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页码：C484 / C484
页数：1
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