ALUMINUM EPITAXY ON SI(111) AND SI(100) USING AN IONIZED CLUSTER BEAM

被引：15
作者：
YAMADA, I
INOKAWA, H
TAKAGI, T
机构：
来源：
THIN SOLID FILMS | 1985年 / 124卷 / 3-4期
关键词：
D O I：
10.1016/0040-6090(85)90263-9
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：179 / 184
页数：6
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