TEMPERATURE-DEPENDENT RESISTIVITY MEASUREMENTS ON POLYCRYSTALLINE SIO2-COVERED THIN NICKEL FILMS

被引:17
作者
DEVRIES, JWC
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D O I
10.1016/0040-6090(87)90092-7
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T [工业技术];
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08 ;
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页码:209 / 215
页数:7
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