INTERRELATIONSHIP BETWEEN DEPOSITION TEMPERATURE AND MORPHOLOGY OF SNO2 FILMS DEPOSITED BY A PYROSOL PROCESS

被引:16
作者
CAILLAUD, F [1 ]
SMITH, A [1 ]
BAUMARD, JF [1 ]
机构
[1] ECOLE NATL SUPER CERAM IND,CNRS,UA 320,47 A 73 AVE ALBERT THOMAS,F-87065 LIMOGES,FRANCE
关键词
D O I
10.1016/0040-6090(92)90937-7
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
SnO2 films have been deposited on hot alumina substrates using a pyrosol technique. Depending on the deposition temperature (from 450 up to 600-degrees-C), the textures range from dense to porous deposits. The morphologies obtained are discussed according to models developed for conventional CVD techniques where the deposition temperatures are much greater than for the pyrosol method.
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收藏
页码:4 / 6
页数:3
相关论文
共 7 条
[1]   FUNDAMENTALS OF CHEMICAL VAPOR-DEPOSITION [J].
BRYANT, WA .
JOURNAL OF MATERIALS SCIENCE, 1977, 12 (07) :1285-1306
[2]  
Caillaud F., 1990, Journal of the European Ceramic Society, V6, P313, DOI 10.1016/0955-2219(90)90022-8
[3]   INTERRELATIONSHIPS BETWEEN PROCESS PARAMETERS, STRUCTURE, AND PROPERTIES OF CVD TUNGSTEN AND TUNGSTEN-RHENIUM ALLOYS [J].
HOLMAN, WR ;
HUEGEL, FJ .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1974, 11 (04) :701-708
[4]  
SIEFERT W, 1984, THIN SOLID FILMS, V121, P275
[5]  
VANDERDRIFT A, 1967, PHILIPS RES REP, V22, P267
[6]   ELECTRICAL AND OPTICAL-PROPERTIES OF PYROLYTICALLY SPRAYED SNO2 FILMS DEPENDENCE ON SUBSTRATE-TEMPERATURE AND SUBSTRATE NOZZLE DISTANCE [J].
VASU, V ;
SUBRAHMANYAM, A .
THIN SOLID FILMS, 1990, 189 (02) :217-225
[7]   CHEMICAL VAPOR-DEPOSITION AT LOW-TEMPERATURES [J].
VIGUIE, JC ;
SPITZ, J .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1975, 122 (04) :585-588