Intellectual property management system: Develop and self-assess using IPM model

被引：10

作者：

Gargate, Gouri ^{[1
]}

Momaya, K. S. ^{[2
]}

机构：

[1] Indian Inst Technol, CSE, Bombay 400076, Maharashtra, India

[2] Indian Inst Technol, Shailesh J Mehta Sch Management, Bombay 400076, Maharashtra, India

来源：

WORLD PATENT INFORMATION | 2018年 / 52卷

关键词：

Intellectual property; Management; Patent; Electrical engineering; India; Innovation; Strategy; Intangible; Developing countries/nations;

D O I：

10.1016/j.wpi.2018.01.005

中图分类号：

G25 [图书馆学、图书馆事业]; G35 [情报学、情报工作];

学科分类号：

1205 ; 120501 ;

摘要：

The major concern in organizations, especially from developing countries, is that there is a huge gap in Intellectual Property (IP) generation and its commercialization. The key issue is that how this gap between IP generation and its commercialization can be reduced. Hence, there is a need to develop an IPM model, which can assist technology and IP managers to develop their own IPMS as well as help in self-assessment of the existing IPMS. This paper introduces an IPM model, which is easy to implement and follow and can be applied to any sector with some modifications. The model suggests 5 stages and 15 major IPM processes. The validation of the model confirmed effortless establishment of IPMS including the identification of potential IP. The IPM model also helped to reveal the gaps, if any, in the current IPMS, and facilitated strategic commercialization of organizational IP. The study followed the case study methodology. (C) 2018 Elsevier Ltd. All rights reserved.

引用

页码：29 / 41

页数：13

共 31 条

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