PULSED OVERLOAD TOLERANCE OF SI-CR, NI-CR AND MO-SI THIN-FILM RESISTORS ON INTEGRATED-CIRCUITS

被引：0
作者：
KEENAN, WF [1 ]
机构：
[1] TEXAS INSTR INC,DALLAS,TX 75222
来源：
IEEE TRANSACTIONS ON RELIABILITY | 1976年 / 25卷 / 04期
关键词：
D O I：
10.1109/TR.1976.5219983
中图分类号：
TP3 [计算技术、计算机技术];
学科分类号：
0812 ;
摘要：
引用
收藏
页码：248 / 254
页数：7
相关论文
共 50 条
  • [31] Formation and properties of nickel silicides in the Ni/Mo/Ni/Si(100) thin-film system
    Messai, Imad
    Bounab, El-oualid
    JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS, 2025, 36 (05)
  • [32] PROPERTIES OF HIGH-RESISTIVITY CR-SI-O THIN-FILM RESISTOR
    NARIZUKA, Y
    KAWAHITO, T
    KAMEI, T
    KOBAYASHI, S
    IEEE TRANSACTIONS ON COMPONENTS HYBRIDS AND MANUFACTURING TECHNOLOGY, 1988, 11 (04): : 433 - 438
  • [33] SYSTEMATIC STUDIES OF ALPHA-PARTICLE ELASTIC-SCATTERING AND PROTON-INDUCED X-RAY-EMISSION ON NI-CR THIN-FILM RESISTORS
    JARJIS, RA
    NUCLEAR INSTRUMENTS & METHODS, 1979, 160 (03): : 457 - 460
  • [34] Investigation into Microstructural and Electrical Characteristics of Ni-Cr-Si Thin-Film Resistors Deposited in Al2O3 Substrate Using DC and RF Magnetron Sputtering
    Chiang, Chen-Su
    Lee, Wen-Hsi
    Jap, Franco
    2014 INTERNATIONAL SYMPOSIUM ON NEXT-GENERATION ELECTRONICS (ISNE), 2014,
  • [35] Comparison of NiCr-O and Cr-Si thin film resistors with mid-range of electric resistance
    Dong, X.P.
    Wu, J.S.
    Mao, D.L.
    Mao, L.Z.
    Shanghai Jiaotong Daxue Xuebao/Journal of Shanghai Jiaotong University, 2000, 34 (12): : 1610 - 1614
  • [36] SOLID-STATE REACTIONS AND DIFFUSION-PROCESSES IN METAL-SI3N4-SI THIN-FILM SYSTEMS - A COMPARISON BETWEEN CR, CO AND NI METALS
    EDELMAN, F
    GUTMANAS, EY
    BRENER, R
    VACUUM, 1990, 41 (4-6) : 1268 - 1271
  • [37] Thermal stability of Pt/Cr and Pt/Cr2O3 thin-film layers on a SiNx/Si substrate for thermal sensor applications
    Garraud, Alexandra
    Combette, Philippe
    Giani, Alain
    THIN SOLID FILMS, 2013, 540 : 256 - 260
  • [38] STUDIES OF A HIGH ACCURACY Ni-Cr-Si THIN FILM RESISTOR FOR PCM-120 SYSTEM.
    Kaneoya, Ryoichi
    Matsumoto, Tadashi
    Moriya, Kunio
    Jinno, Takamitsu
    1600, (22): : 1 - 2
  • [39] Solid-phase diffusion interaction in multilayer thin-film system Cr/Cu/Ni under pulsed laser heating
    Vasylyev, M.
    Nishenko, M.M.
    Sidorenko, S.
    Voloshko, S.
    Defect and Diffusion Forum, 2007, 272 : 31 - 40
  • [40] THE EFFECT OF INTERPOSED SILICIDE THICKNESS ON GROWTH-RATE IN BILAYER SILICIDE THIN-FILM STRUCTURES - THE SI(111)/PD2SI/CR SYSTEM
    ZINGU, EC
    COMRIE, C
    PRETORIUS, R
    JOURNAL OF APPLIED PHYSICS, 1983, 54 (05) : 2392 - 2401
12345