MATRIX ENDOR OF POLYENYL RADICALS IN POLYMERS

被引：38

作者：

HELBERT, JN

WAGNER, BE

POINDEXTER, EH

KEVAN, L

机构：

[1] WAYNE STATE UNIV,DETROIT,MI 48202

[2] USA,ELECTR TECHNOL & DEVICES LAB,FT MONMOUTH,NJ 07702

来源：

JOURNAL OF POLYMER SCIENCE PART B-POLYMER PHYSICS | 1975年 / 13卷 / 04期

关键词：

D O I：

10.1002/pol.1975.180130414

中图分类号：

O63 [高分子化学（高聚物）];

学科分类号：

070305 ; 080501 ; 081704 ;

摘要：

引用

页码：825 / 834

页数：10

共 19 条

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[18]

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[19] NEW FAMILY OF POSITIVE ELECTRON-BEAM RESISTS-POLY(OLEFIN SULFONES) [J].

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