ELECTRICAL-CONDUCTIVITY OF AMORPHOUS-CHALCOGENIDE FILMS IN AS-SE-SB SYSTEM

被引:10
|
作者
SAKATA, H
NAKAO, N
机构
[1] Department of Applied Chemistry, Faculty of Engineering, Tokai University, Hiratsuka, Kanagawa, 259-12, 1117, Kitakaname
关键词
D O I
10.1016/0022-3093(93)91300-R
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
The dc electrical conductivities of undoped and Mo-doped amorphous As-Se-Sb films of thickness 600 angstrom were measured over a range of temperature from 90 to 290 K. The films were prepared by resistance heating and vacuum evaporation. DC conductivities were measured by a four-point technique as a function of temperature from 90 to 290 K. Samples were in normal atmosphere during conductivity measurements. An As26Se60Sb14 film had conductivities from 10(-8) to 10(-10) S cm-1 and the conduction is due to hopping conduction at temperatures > 225 K and to two-dimensional variable-range hopping at temperatures < 185 K. Both mechanisms coexist at temperatures from 185 to 225 K. Mo-doped 23 at.% amorphous As40-xSe60Sbx (x=3-14 at.%) films had a conductivity of 10(2)-10(3) S cm-1 and had no measureable temperature dependence. This temperature invariance is interpreted in terms of the metal-insulator transition.
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页码:236 / 241
页数:6
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