SECONDARY-ELECTRON EFFECT ON POWER VOLTAGE RELATIONSHIP IN RF SPUTTERING

被引：4

作者：

BUMBLE, B

CUOMO, JJ

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1985年 / 3卷 / 03期

关键词：

D O I：

10.1116/1.572976

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：667 / 670

页数：4

共 11 条

[1] EXCITATION OF ELECTRONS IN SOLIDS BY RELATIVELY SLOW ATOMIC PARTICLES [J].

ABROYAN, IA ;

EREMEEV, MA ;

PETROV, NN .

SOVIET PHYSICS USPEKHI-USSR, 1967, 10 (03) :332-+

[2]

BEULER RJ, 1977, J APPL PHYS, V48, P3928

[3]

BRUINING H, 1954, PHYSICS APPLICATIONS

[4]

Chapman B.N., 1980, GLOW DISCHARGE PROCE, DOI DOI 10.1063/1.2914660

[5] POSITIVE-ION BOMBARDMENT OF SUBSTRATES IN RF DIODE GLOW-DISCHARGE SPUTTERING [J].

COBURN, JW ;

KAY, E .

JOURNAL OF APPLIED PHYSICS, 1972, 43 (12) :4965-4971

[6] MODIFICATION OF NIOBIUM FILM STRESS BY LOW-ENERGY ION-BOMBARDMENT DURING DEPOSITION [J].

CUOMO, JJ ;

HARPER, JME ;

GUARNIERI, CR ;

YEE, DS ;

ATTANASIO, LJ ;

ANGILELLO, J ;

WU, CT ;

HAMMOND, RH .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1982, 20 (03) :349-354

[7]

Gibbons J.F., 1975, PROJECTED RANGE STAT, V2nd

[8] RADIO-FREQUENCY SPUTTERING - THE SIGNIFICANCE OF POWER INPUT [J].

HORWITZ, CM .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1983, 1 (04) :1795-1800

[9] CALCULATION OF THE CURRENT-VOLTAGE-PRESSURE CHARACTERISTICS OF DC DIODE SPUTTERING DISCHARGES [J].

MANIV, S ;

WESTWOOD, WD ;

SCANLON, PJ .

JOURNAL OF APPLIED PHYSICS, 1982, 53 (02) :856-860

[10] MAGNETRON SPUTTERING - BASIC PHYSICS AND APPLICATION TO CYLINDRICAL MAGNETRONS [J].

THORNTON, JA .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1978, 15 (02) :171-177

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