TRANSIENT NONLINEAR LASER-HEATING AND DEPOSITION - A COMPARISON OF THEORY AND EXPERIMENT

被引:36
作者
ALLEN, SD
GOLDSTONE, JA
STONE, JP
JAN, RY
机构
基金
美国国家科学基金会;
关键词
D O I
10.1063/1.336479
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
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页码:1653 / 1657
页数:5
相关论文
共 21 条
[1]   LASER CHEMICAL VAPOR-DEPOSITION OF SELECTED AREA FE AND W FILMS [J].
ALLEN, SD ;
TRINGUBO, AB .
JOURNAL OF APPLIED PHYSICS, 1983, 54 (03) :1641-1643
[2]   REAL-TIME MEASUREMENT OF DEPOSITION INITIATION AND RATE IN LASER CHEMICAL VAPOR-DEPOSITION [J].
ALLEN, SD ;
JAN, RY ;
MAZUK, SM ;
VERNON, SD .
JOURNAL OF APPLIED PHYSICS, 1985, 58 (01) :327-331
[3]  
ALLEN SD, 1984, P SOC PHOTO-OPT INST, V459, P42, DOI 10.1117/12.939433
[4]   TIME-RESOLVED REFLECTIVITY OF ION-IMPLANTED SILICON DURING LASER ANNEALING [J].
AUSTON, DH ;
SURKO, CM ;
VENKATESAN, TNC ;
SLUSHER, RE ;
GOLOVCHENKO, JA .
APPLIED PHYSICS LETTERS, 1978, 33 (05) :437-440
[5]   MODELING OF CW LASER ANNEALING OF MULTILAYER STRUCTURES [J].
CALDER, ID ;
SUE, R .
JOURNAL OF APPLIED PHYSICS, 1982, 53 (11) :7545-7550
[6]  
CARLTON HE, 1967, AM I CHEM ENG J, V12, P86
[7]   TRANSIENT TEMPERATURE PROFILES IN SOLIDS HEATED WITH SCANNING LASER [J].
CHEN, I ;
LEE, S .
JOURNAL OF APPLIED PHYSICS, 1983, 54 (02) :1062-1066
[8]  
COPLEY SM, COMMUNICATION
[9]  
EDWARDS RH, CALCULATIONS PROGR
[10]  
EHRLICH DJ, 1983, J VAC SCI TECHNOL B, V1, P981