GAS CLUSTER ION-BEAM EQUIPMENTS FOR INDUSTRIAL APPLICATIONS

被引：25
作者：
MATSUO, J [1 ]
ABE, H [1 ]
TAKAOKA, GH [1 ]
YAMADA, I [1 ]
机构：
[1] AYUMI IND CO LTD,HIMEJI,HYOGO 67102,JAPAN
来源：
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 1995年 / 99卷 / 1-4期
关键词：
D O I：
10.1016/0168-583X(95)00338-X
中图分类号：
TH7 [仪器、仪表];
学科分类号：
0804 ; 080401 ; 081102 ;
摘要：
30 keV and 200 keV gas cluster ion beam equipments have been developed for industrial applications. A gas cluster source with a non-cooled nozzle was used for both the equipments. Sufficient monomer ion suppression was achieved by using an E X B filter and chromatic lenses mass filter with low extraction voltage. These equipments are suitable to be used for low-damage surface treatment of metals, insulators and semiconductors without heavy metal contamination.
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收藏
页码：244 / 247
页数：4
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