GAS CLUSTER ION-BEAM EQUIPMENTS FOR INDUSTRIAL APPLICATIONS

被引：25

作者：

MATSUO, J ^{[1
]}

ABE, H ^{[1
]}

TAKAOKA, GH ^{[1
]}

YAMADA, I ^{[1
]}

机构：

[1] AYUMI IND CO LTD,HIMEJI,HYOGO 67102,JAPAN

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 1995年 / 99卷 / 1-4期

关键词：

D O I：

10.1016/0168-583X(95)00338-X

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

30 keV and 200 keV gas cluster ion beam equipments have been developed for industrial applications. A gas cluster source with a non-cooled nozzle was used for both the equipments. Sufficient monomer ion suppression was achieved by using an E X B filter and chromatic lenses mass filter with low extraction voltage. These equipments are suitable to be used for low-damage surface treatment of metals, insulators and semiconductors without heavy metal contamination.

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页码：244 / 247

页数：4

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