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THE FUNDAMENTAL ABSORPTION-EDGE IN BI12SIO20
被引:14
作者
:
TOYODA, T
论文数:
0
引用数:
0
h-index:
0
机构:
FUJI ELECT CORP RES & DEV LTD,YUKOSUKA CITY 24001,JAPAN
TOYODA, T
MARUYAMA, S
论文数:
0
引用数:
0
h-index:
0
机构:
FUJI ELECT CORP RES & DEV LTD,YUKOSUKA CITY 24001,JAPAN
MARUYAMA, S
NAKANISHI, H
论文数:
0
引用数:
0
h-index:
0
机构:
FUJI ELECT CORP RES & DEV LTD,YUKOSUKA CITY 24001,JAPAN
NAKANISHI, H
ENDO, S
论文数:
0
引用数:
0
h-index:
0
机构:
FUJI ELECT CORP RES & DEV LTD,YUKOSUKA CITY 24001,JAPAN
ENDO, S
IRIE, T
论文数:
0
引用数:
0
h-index:
0
机构:
FUJI ELECT CORP RES & DEV LTD,YUKOSUKA CITY 24001,JAPAN
IRIE, T
机构
:
[1]
FUJI ELECT CORP RES & DEV LTD,YUKOSUKA CITY 24001,JAPAN
[2]
SCI UNIV TOKYO,FAC SCI & TECHNOL,DEPT ELECT ENGN,NODA,CHIBA 278,JAPAN
[3]
SCI UNIV TOKYO,FAC ENGN,DEPT ELECT ENGN,SHINJUKU KU,TOKYO 162,JAPAN
来源
:
JOURNAL OF PHYSICS D-APPLIED PHYSICS
|
1986年
/ 19卷
/ 05期
关键词
:
D O I
:
10.1088/0022-3727/19/5/023
中图分类号
:
O59 [应用物理学];
学科分类号
:
摘要
:
引用
收藏
页码:909 / 915
页数:7
相关论文
共 15 条
[11]
IMAGING CHARACTERISTICS OF ITEK PROM
LIPSON, SG
论文数:
0
引用数:
0
h-index:
0
机构:
ITEK CORP,LEXINGTON,MA 02173
ITEK CORP,LEXINGTON,MA 02173
LIPSON, SG
NISENSON, P
论文数:
0
引用数:
0
h-index:
0
机构:
ITEK CORP,LEXINGTON,MA 02173
ITEK CORP,LEXINGTON,MA 02173
NISENSON, P
[J].
APPLIED OPTICS,
1974,
13
(09):
: 2052
-
2060
[12]
MARIE G, 1974, ADV IMAGE PICKUP DIS, V1
[13]
Pankove J. I, 1971, OPTICAL PROCESSES SE
[14]
SVENSSON C, 1979, ACTA CRYSTALLOGR B, V35, P2678
[15]
CZOCHRALSKI GROWTH OF OPTICAL QUALITY BISMUTH SILICON-OXIDE (BI12SIO20)
TANGUAY, AR
论文数:
0
引用数:
0
h-index:
0
机构:
YALE UNIV,DEPT ENGN & APPL SCI,NEW HAVEN,CT 06520
YALE UNIV,DEPT ENGN & APPL SCI,NEW HAVEN,CT 06520
TANGUAY, AR
MROCZKOWSKI, S
论文数:
0
引用数:
0
h-index:
0
机构:
YALE UNIV,DEPT ENGN & APPL SCI,NEW HAVEN,CT 06520
YALE UNIV,DEPT ENGN & APPL SCI,NEW HAVEN,CT 06520
MROCZKOWSKI, S
BARKER, RC
论文数:
0
引用数:
0
h-index:
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机构:
YALE UNIV,DEPT ENGN & APPL SCI,NEW HAVEN,CT 06520
YALE UNIV,DEPT ENGN & APPL SCI,NEW HAVEN,CT 06520
BARKER, RC
[J].
JOURNAL OF CRYSTAL GROWTH,
1977,
42
(DEC)
: 431
-
434
←
1
2
→
共 15 条
[11]
IMAGING CHARACTERISTICS OF ITEK PROM
LIPSON, SG
论文数:
0
引用数:
0
h-index:
0
机构:
ITEK CORP,LEXINGTON,MA 02173
ITEK CORP,LEXINGTON,MA 02173
LIPSON, SG
NISENSON, P
论文数:
0
引用数:
0
h-index:
0
机构:
ITEK CORP,LEXINGTON,MA 02173
ITEK CORP,LEXINGTON,MA 02173
NISENSON, P
[J].
APPLIED OPTICS,
1974,
13
(09):
: 2052
-
2060
[12]
MARIE G, 1974, ADV IMAGE PICKUP DIS, V1
[13]
Pankove J. I, 1971, OPTICAL PROCESSES SE
[14]
SVENSSON C, 1979, ACTA CRYSTALLOGR B, V35, P2678
[15]
CZOCHRALSKI GROWTH OF OPTICAL QUALITY BISMUTH SILICON-OXIDE (BI12SIO20)
TANGUAY, AR
论文数:
0
引用数:
0
h-index:
0
机构:
YALE UNIV,DEPT ENGN & APPL SCI,NEW HAVEN,CT 06520
YALE UNIV,DEPT ENGN & APPL SCI,NEW HAVEN,CT 06520
TANGUAY, AR
MROCZKOWSKI, S
论文数:
0
引用数:
0
h-index:
0
机构:
YALE UNIV,DEPT ENGN & APPL SCI,NEW HAVEN,CT 06520
YALE UNIV,DEPT ENGN & APPL SCI,NEW HAVEN,CT 06520
MROCZKOWSKI, S
BARKER, RC
论文数:
0
引用数:
0
h-index:
0
机构:
YALE UNIV,DEPT ENGN & APPL SCI,NEW HAVEN,CT 06520
YALE UNIV,DEPT ENGN & APPL SCI,NEW HAVEN,CT 06520
BARKER, RC
[J].
JOURNAL OF CRYSTAL GROWTH,
1977,
42
(DEC)
: 431
-
434
←
1
2
→