THE EFFECT OF HYDROGEN PLASMA ON THE LOW-TEMPERATURE EPITAXIAL-GROWTH OF INSB

被引：13
|
作者：
OHSHIMA, T
YAMAUCHI, S
HARIU, T
机构：
来源：
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS | 1989年 / 28卷 / 01期
关键词：
D O I：
10.1143/JJAP.28.L13
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
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页码：L13 / L15
页数：3
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