NEGATIVE DIFFERENTIAL RESISTANCE ON THE ATOMIC SCALE - IMPLICATIONS FOR ATOMIC SCALE DEVICES

被引：229

作者：

LYO, IW

AVOURIS, P

机构：

来源：

关键词：

D O I：

10.1126/science.245.4924.1369

中图分类号：

O [数理科学和化学]; P [天文学、地球科学]; Q [生物科学]; N [自然科学总论];

学科分类号：

07 ; 0710 ; 09 ;

摘要：

引用

页码：1369 / 1371

页数：3

共 19 条

[11] THEORY OF ATOMIC CHEMISORPTION ON SIMPLE METALS
LANG, ND
WILLIAMS, AR
[J]. PHYSICAL REVIEW B, 1978, 18 (02): : 616 - 636
[12] LANG ND, 1986, PHYS REV D, V34, P5747
[13] LYO IW, IN PRESS PHY REV LET
[14] NOGAMI J, 1987, PHYS REV B, V35, P4137
[15] VACUUM TUNNELING - A NEW TECHNIQUE FOR MICROSCOPY
QUATE, CF
[J]. PHYSICS TODAY, 1986, 39 (08) : 26 - 33
[16] SZE SM, 1981, PHYSICS SEMICONDUCTO
[17] QUANTUM STATES AND ATOMIC-STRUCTURE OF SILICON SURFACES
TROMP, RM
HAMERS, RJ
DEMUTH, JE
[J]. SCIENCE, 1986, 234 (4774) : 304 - 309
[18] PHOTOEMISSION-STUDY OF THE SURFACE AND BULK ELECTRONIC-STRUCTURES OF SI(111)7X7 AND SI(111) SQUARE-ROOT-3X3-SQUARE-ROOT-AL
UHRBERG, RIG
HANSSON, GV
NICHOLLS, JM
PERSSON, PES
FLODSTROM, SA
[J]. PHYSICAL REVIEW B, 1985, 31 (06): : 3805 - 3810
[19] ATOM-RESOLVED SURFACE-CHEMISTRY USING SCANNING TUNNELING MICROSCOPY
WOLKOW, R
AVOURIS, P
[J]. PHYSICAL REVIEW LETTERS, 1988, 60 (11) : 1049 - 1052