NEGATIVE DIFFERENTIAL RESISTANCE ON THE ATOMIC SCALE - IMPLICATIONS FOR ATOMIC SCALE DEVICES

被引：230
作者：
LYO, IW
AVOURIS, P
机构：
来源：
SCIENCE | 1989年 / 245卷 / 4924期
关键词：
D O I：
10.1126/science.245.4924.1369
中图分类号：
O [数理科学和化学]; P [天文学、地球科学]; Q [生物科学]; N [自然科学总论];
学科分类号：
07 ; 0710 ; 09 ;
摘要：
引用
收藏
页码：1369 / 1371
页数：3
相关论文
共 19 条
[11]   THEORY OF ATOMIC CHEMISORPTION ON SIMPLE METALS [J].
LANG, ND ;
WILLIAMS, AR .
PHYSICAL REVIEW B, 1978, 18 (02) :616-636
[12]  
LANG ND, 1986, PHYS REV D, V34, P5747
[13]  
LYO IW, IN PRESS PHY REV LET
[14]  
NOGAMI J, 1987, PHYS REV B, V35, P4137
[15]   VACUUM TUNNELING - A NEW TECHNIQUE FOR MICROSCOPY [J].
QUATE, CF .
PHYSICS TODAY, 1986, 39 (08) :26-33
[16]  
SZE SM, 1981, PHYSICS SEMICONDUCTO
[17]   QUANTUM STATES AND ATOMIC-STRUCTURE OF SILICON SURFACES [J].
TROMP, RM ;
HAMERS, RJ ;
DEMUTH, JE .
SCIENCE, 1986, 234 (4774) :304-309
[18]   PHOTOEMISSION-STUDY OF THE SURFACE AND BULK ELECTRONIC-STRUCTURES OF SI(111)7X7 AND SI(111) SQUARE-ROOT-3X3-SQUARE-ROOT-AL [J].
UHRBERG, RIG ;
HANSSON, GV ;
NICHOLLS, JM ;
PERSSON, PES ;
FLODSTROM, SA .
PHYSICAL REVIEW B, 1985, 31 (06) :3805-3810
[19]   ATOM-RESOLVED SURFACE-CHEMISTRY USING SCANNING TUNNELING MICROSCOPY [J].
WOLKOW, R ;
AVOURIS, P .
PHYSICAL REVIEW LETTERS, 1988, 60 (11) :1049-1052
12