共 50 条
- [1] DEPOSITION OF SILVER FILMS BY PLASMA-ENHANCED CHEMICAL VAPOR-DEPOSITION APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1989, 49 (06): : 691 - 696
- [3] DEPOSITION OF THIN RHODIUM FILMS BY PLASMA-ENHANCED CHEMICAL VAPOR-DEPOSITION APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1989, 48 (04): : 373 - 375
- [4] PROPERTIES OF TITANIUM SILICIDE FILMS DEPOSITED BY PLASMA-ENHANCED CHEMICAL VAPOR-DEPOSITION JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1986, 4 (06): : 1332 - 1335
- [5] HYDROGEN IN PLASMA-ENHANCED CHEMICAL VAPOR-DEPOSITION INSULATING FILMS MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING, 1991, 139 (1-2): : 401 - 407
- [6] PLASMA-ENHANCED CHEMICAL VAPOR-DEPOSITION OF COPPER JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 1991, 30 (08): : 1813 - 1817
- [10] STRESS MODIFICATION AND CHARACTERIZATION OF THIN SIC FILMS GROWN BY PLASMA-ENHANCED CHEMICAL VAPOR-DEPOSITION MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 1992, 11 (1-4): : 73 - 77