IMPROVED LSI METALLIZATION USING SI-AL SEQUENTIAL EVAPORATION AND ANODIZATION

被引：0
|
作者：
TAKAHATA, K [1 ]
KAUCHI, K [1 ]
KUBOTA, T [1 ]
MUKOHGAWA, M [1 ]
SHIBA, H [1 ]
机构：
[1] NIPPON ELECT CO LTD,DIV INTEGRATED CIRCUITS,NAKAHARA KU,KAWASAKI,JAPAN
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1976年 / 123卷 / 08期
关键词：
D O I：
暂无
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
引用
收藏
页码：C269 / C269
页数：1
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