OPTICAL-PROPERTIES OF REACTIVELY SPUTTERED TA2O5 FILMS

被引：46

作者：

RUBIO, F

ALBELLA, JM

DENIS, J

MARTINEZDUART, JM

机构：

[1] UNIV AUTONOMA MADRID,CSIC,DEPT FIS APLICADA,MADRID 34,SPAIN

[2] UNIV AUTONOMA MADRID,CSIC,INST FIS ESTADO SOLIDO,MADRID 34,SPAIN

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1982年 / 21卷 / 04期

关键词：

D O I：

10.1116/1.571862

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1043 / 1045

页数：3

共 18 条

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[9] EFFECTS OF DEPOSITION PARAMETERS ON OPTICAL LOSS FOR RF-SPUTTERED TA2O5 AND SI3N4 WAVEGUIDES [J].

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