SEMICONDUCTOR SURFACE DOPING BY ELECTRON-BEAM MELTING OF THIN EVAPORATED LAYERS

被引：0
|
作者：
MUNITZ, A [1 ]
BURSHTEIN, Z [1 ]
BAMBERGER, M [1 ]
机构：
[1] TECHNION ISRAEL INST TECHNOL,IL-32000 HAIFA,ISRAEL
来源：
MATERIALS RESEARCH BULLETIN | 1985年 / 20卷 / 07期
关键词：
D O I：
10.1016/0025-5408(85)90059-5
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
31
引用
收藏
页码：803 / 813
页数：11
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