MAGNETOTRANSPORT IN INAS/ALSB QUANTUM-WELLS WITH LARGE ELECTRON-CONCENTRATION MODULATION

被引:13
作者
NGUYEN, C
ENSSLIN, K
KROEMER, H
机构
[1] Department of Electrical and Computer Engineering, University of California, Santa Barbara
关键词
D O I
10.1016/0039-6028(92)91197-J
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
We report measurements of magnetocapacitance, Hall resistance, and magnetoresistance of gated InAs/AlSb quantum wells. By varying the voltage between the front gate and the two-dimensional electron gas, we were able to make magneto-transport measurements at 4.2 K for electron concentrations covering a range from 3 x 10(11) to 3 x 10(12) cm-2. A strongly modified magnetocapacitance signal and a drop in the mobility were observed as the second subband became populated. The relation of gate voltage to density of mobile carriers obtained from these measurements was in agreement with the simple capacitor model, indicating the absence of Fermi level pinning in the quantum well.
引用
收藏
页码:549 / 552
页数:4
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  • [1] POPULATION PROCESS OF THE UPPER SUBBAND IN ALXGA1-XAS-GAAS QUANTUM WELLS
    ENSSLIN, K
    HEITMANN, D
    GERHARDTS, RR
    PLOOG, K
    [J]. PHYSICAL REVIEW B, 1989, 39 (17): : 12993 - 12996
  • [2] QUANTUM HALL-EFFECT IN INAS/ALSB QUANTUM-WELLS
    HOPKINS, PF
    RIMBERG, AJ
    WESTERVELT, RM
    TUTTLE, G
    KROEMER, H
    [J]. APPLIED PHYSICS LETTERS, 1991, 58 (13) : 1428 - 1430
  • [3] GROWTH AND TRANSPORT-PROPERTIES OF (GA,AL)SB BARRIERS ON INAS
    MUNEKATA, H
    SMITH, TP
    CHANG, LL
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1989, 7 (02): : 324 - 326
  • [4] ELECTRICAL-PROPERTIES AND BAND OFFSETS OF INAS/ALSB N-N ISOTYPE HETEROJUNCTIONS GROWN ON GAAS
    NAKAGAWA, A
    KROEMER, H
    ENGLISH, JH
    [J]. APPLIED PHYSICS LETTERS, 1989, 54 (19) : 1893 - 1895
  • [5] ELECTRON CONCENTRATIONS AND MOBILITIES IN ALSB/INAS/ALSB QUANTUM WELLS
    TUTTLE, G
    KROEMER, H
    ENGLISH, JH
    [J]. JOURNAL OF APPLIED PHYSICS, 1989, 65 (12) : 5239 - 5242
  • [6] INAS-ALSB HETEROSTRUCTURE FIELD-EFFECT TRANSISTORS FABRICATED USING ARGON IMPLANTATION FOR DEVICE ISOLATION
    WERKING, J
    TUTTLE, G
    NGUYEN, C
    HU, EL
    KROEMER, H
    [J]. APPLIED PHYSICS LETTERS, 1990, 57 (09) : 905 - 907