LIMITATION OF CRITICAL CURRENT-DENSITY BY INTERMETALLIC FORMATION IN FINE FILAMENT NB-TI SUPERCONDUCTORS

被引:8
作者
LARBALESTIER, DC
LI, CG
STARCH, W
LEE, PJ
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关键词
D O I
10.1109/TNS.1985.4334488
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
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页码:3743 / 3745
页数:3
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