ANNEALING BEHAVIOR OF ION-IMPLANTED FE IN INP

被引：22

作者：

SCHWARZ, SA

SCHWARTZ, B

SHENG, TT

SINGH, S

TELL, B

机构：

[1] AT & T BELL LABS,MURRAY HILL,NJ 07974

[2] AT & T BELL LABS,HOLMDEL,NJ 07733

来源：

JOURNAL OF APPLIED PHYSICS | 1985年 / 58卷 / 04期

关键词：

D O I：

10.1063/1.336040

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1698 / 1700

页数：3

共 21 条

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[10] REDISTRIBUTION OF FE IN THERMALLY ANNEALED SEMI-INSULATING INP(FE) - DETERMINATION OF FE DIFFUSION-COEFFICIENT IN INP [J].

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