ATOMIC MODIFICATION OF AN SI(111)7X7 SURFACE WITH ADSORBED CHLORINE ATOMS USING A SCANNING TUNNELING MICROSCOPE

被引：10
|
作者：
BABA, M
MATSUI, S
机构：
[1] Fundamental Research Laboratories, NEC Corporation, Tsukuba, Ibaraki 305
来源：
APPLIED PHYSICS LETTERS | 1994年 / 65卷 / 15期
关键词：
D O I：
10.1063/1.112819
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
A scanning tunneling microscope is used to modify a Si(111)7x7 surface structure with adsorbed chlorine atoms. One Si adatom at the center site is extracted from the surface by field evaporation and the other atom is moved by field-induced diffusion. This modification is caused by the coordinated breaking of bonds and the moving of adatoms to their adjacent areas as the result of Cl chemical reactivity. (C) 1994 American Institute of Physics.
引用
收藏
页码：1927 / 1929
页数：3
相关论文
共 50 条
  • [41] Atomic dipole moment distribution of si atoms on a Si(111)-(7x7) surface studied using noncontact scanning nonlinear dielectric microscopy
    Cho, Yasuo
    Hirose, Ryusuke
    PHYSICAL REVIEW LETTERS, 2007, 99 (18)
  • [42] Measurement of distribution of charge adsorbed on Aux/Si(111)-7x7 surface on an atomic scale
    Feng, Jie
    Guo, Qiang
    Shu, Peng-Li
    Wen, Yang
    Wen, Huan-Fei
    Ma, Zong-Min
    Li, Yan-Jun
    Liu, Jun
    Yaminsky, Igor Vladimirovich
    ACTA PHYSICA SINICA, 2023, 72 (11)
  • [43] ATOMIC-STRUCTURE OF SI(111) 7X7 SURFACE
    MARK, P
    LEVINE, JD
    MCFARLANE, SH
    PHYSICAL REVIEW LETTERS, 1977, 38 (24) : 1408 - 1411
  • [44] Tin atoms adsorbed on a Si(111)-(7 x 7) surface
    Xie, ZX
    Tanaka, K
    SURFACE SCIENCE, 2001, 479 (1-3) : 26 - 32
  • [45] A scanning tunneling microscopy investigation of adsorption and clustering of potassium on the Si(111)7x7 surface
    Watanabe, A
    Naitoh, M
    Nishigaki, S
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 1998, 37 (6B): : 3778 - 3781
  • [46] SURFACE PHOTOVOLTAGE ON SI(111)-(7X7) PROBED BY OPTICALLY PUMPED SCANNING TUNNELING MICROSCOPY
    HAMERS, RJ
    MARKERT, K
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1990, 8 (04): : 3524 - 3530
  • [47] Characteristic structures of the Si(111)-7x7 surface step studied by scanning tunneling microscopy
    Miyake, K
    Okawa, S
    Takeuchi, O
    Futaba, DN
    Hata, K
    Morita, R
    Yamashita, M
    Shigekawa, H
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2001, 19 (04): : 1549 - 1552
  • [48] Dissociation mechanism of methanol on a Si(111)-(7x7) surface studied by scanning tunneling microscopy
    Xie, ZX
    Uematsu, Y
    Lu, X
    Tanaka, K
    PHYSICAL REVIEW B, 2002, 66 (12) : 1 - 5
  • [49] Thermal nitridation of the Si(111)-(7X7) surface studied by scanning tunneling microscopy and spectroscopy
    Wu, CL
    Hsieh, JL
    Hsueh, HD
    Gwo, S
    PHYSICAL REVIEW B, 2002, 65 (04): : 1 - 6
  • [50] Relaxation of nanostructures on the Si(111)(7x7) surface by high temperature scanning tunneling microscopy
    Ichimiya, A
    Tanaka, Y
    Hayashi, K
    SURFACE REVIEW AND LETTERS, 1998, 5 (3-4) : 821 - 832
12345