ANALYSIS OF CHEMICAL VAPOR-DEPOSITION OF TITANIUM DIBORIDE .2. MODELING KINETICS OF DEPOSITION

被引:31
作者
BESMANN, TM [1 ]
SPEAR, KE [1 ]
机构
[1] PENN STATE UNIV,MAT RES LAB,UNIVERSITY PK,PA 16802
关键词
D O I
10.1149/1.2133408
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
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页码:790 / 797
页数:8
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