X-RAY PHOTOELECTRON-SPECTROSCOPY INVESTIGATION OF ION-BEAM SPUTTERED INDIUM TIN OXIDE-FILMS AS A FUNCTION OF OXYGEN-PRESSURE DURING DEPOSITION

被引：64
作者：
NELSON, AJ [1 ]
AHARONI, H [1 ]
机构：
[1] BEN GURION UNIV NEGEV,DEPT ELECT & COMP ENGN,BEER SHEVA,ISRAEL
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1987年 / 5卷 / 02期
关键词：
D O I：
10.1116/1.574109
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
引用
收藏
页码：231 / 233
页数：3
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