APPLICATION OF AES TO STUDY OF SELECTIVE SPUTTERING OF THIN-FILMS

被引：83

作者：

VANOOSTROM, A ^{[1
]}

机构：

[1] PHILIPS RES LABS,EINDHOVEN,NETHERLANDS

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1976年 / 13卷 / 01期

关键词：

D O I：

10.1116/1.568856

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：224 / 227

页数：4

共 50 条

[21] REACTIVE SPUTTERING OF THIN-FILMS AND INVESTIGATION OF THEIR PROPERTIES
REICHELT, K
VACUUM, 1984, 34 (12) : 1067 - 1067
[22] SUPERCONDUCTIVE THALLIUM THIN-FILMS BY MULTITARGET SPUTTERING
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MERCEY, B
MURRAY, H
SUPERCONDUCTOR SCIENCE & TECHNOLOGY, 1993, 6 (02): : 119 - 125
[23] PHOTODEPOSITION SPUTTERING OF TITANIUM AND TIN THIN-FILMS
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MIHAC, TP
RAKOCEVIC, ZL
THIN SOLID FILMS, 1992, 218 (1-2) : 247 - 251
[24] TANTALUM SILICIDE THIN-FILMS OBTAINED BY SPUTTERING
DEMPSEY, J
DHEURLE, F
IRENE, E
PETERSSON, S
JOURNAL OF ELECTRONIC MATERIALS, 1979, 8 (05) : 721 - 721
[25] A STUDY OF HETEROGENEOUS NIOBIUM CARBONITRIDE THIN-FILMS DEPOSITED BY REACTIVE SPUTTERING
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SPITZ, J
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[26] STUDY ON FERROELECTRIC PLZT THIN-FILMS PREPARED BY RF MAGNETRON SPUTTERING
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LI, ZY
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[27] STUDY AND IMPROVEMENT OF THE ADHESION OF CHROMIUM THIN-FILMS DEPOSITED BY MAGNETRON SPUTTERING
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THIN SOLID FILMS, 1995, 258 (1-2) : 185 - 193
[28] STUDY OF SNO2 THIN-FILMS FORMED BY SPUTTERING AND BY ANODIZING
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JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1974, 121 (03) : 394 - 399
[29] A REVIEW OF THE ANALYSIS OF SURFACES AND THIN-FILMS BY AES AND XPS
SEAH, MP
VACUUM, 1984, 34 (3-4) : 463 - 478
[30] RECRYSTALLIZATION OF INSB THIN-FILMS OBTAINED BY CATHODE SPUTTERING
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KUSIOR, E
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