APPLICATION OF AES TO STUDY OF SELECTIVE SPUTTERING OF THIN-FILMS

被引：83

作者：

VANOOSTROM, A ^{[1
]}

机构：

[1] PHILIPS RES LABS,EINDHOVEN,NETHERLANDS

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1976年 / 13卷 / 01期

关键词：

D O I：

10.1116/1.568856

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

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页码：224 / 227

页数：4

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