APPLICATION OF AES TO STUDY OF SELECTIVE SPUTTERING OF THIN-FILMS

被引：83
|
作者：
VANOOSTROM, A [1 ]
机构：
[1] PHILIPS RES LABS,EINDHOVEN,NETHERLANDS
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1976年 / 13卷 / 01期
关键词：
D O I：
10.1116/1.568856
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：224 / 227
页数：4
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