CHARACTERISTICS OF RADIOFREQUENCY SILICON-CARBIDE FILMS

被引:16
作者
RAVEH, A
INSPEKTOR, A
CARMI, U
AVNI, R
机构
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1987年 / 5卷 / 05期
关键词
D O I
10.1116/1.574317
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
引用
收藏
页码:2836 / 2841
页数:6
相关论文
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