FLUORIDE SEMICONDUCTOR AND SEMICONDUCTOR FLUORIDE SEMICONDUCTOR HETEROEPITAXIAL STRUCTURE RESEARCH - A REVIEW

被引：55
作者：
SINHAROY, S
机构：
[1] Westinghouse Science and Technology Center, Pittsburgh, PA 15235
来源：
THIN SOLID FILMS | 1990年 / 187卷 / 02期
关键词：
D O I：
10.1016/0040-6090(90)90045-F
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
Epitaxial fluorides have attracted attention in recent years because of the many potential microelectronic and optoelectronic device applications of semiconductor/ epitaxial fluoride/semiconductor structures. In this paper, we present a very brief review of the current status of the fluoride/semiconductor structures and a slightly expanded review of the semiconductor/fluoride/semiconductor heteroepitaxial structures that have been reported to date, along with a short discussion of the future prospects of this technology. © 1990.
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页码：231 / 243
页数：13
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