EPITAXIAL SILICIDE FORMATION BY MULTI-SHOT IRRADIATION OF NI THIN-FILMS ON SI WITH ND LASER

被引：11
作者：
HARITH, MA
ZHANG, JP
BAERI, P
RIMINI, E
CELOTTI, G
机构：
[1] UNIV CATANIA,IST DIPARTIMENTALE FIS,I-95129 CATANIA,ITALY
[2] CNR,LAMEL,I-40100 BOLOGNA,ITALY
来源：
JOURNAL OF APPLIED PHYSICS | 1985年 / 57卷 / 10期
关键词：
D O I：
10.1063/1.335360
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：4560 / 4565
页数：6
相关论文
共 15 条
[1]  
BAERI P, 1983, J PHYS PARIS C, V5, P449
[2]   TITANIUM AND NICKEL SILICIDE FORMATION AFTER Q-SWITCHED LASER AND MULTI-SCANNING ELECTRON-BEAM IRRADIATION [J].
BENTINI, GG ;
SERVIDORI, M ;
COHEN, C ;
NIPOTI, R ;
DRIGO, AV .
JOURNAL OF APPLIED PHYSICS, 1982, 53 (03) :1525-1531
[3]   EPITAXIAL NISI2 FORMATION BY PULSED ION-BEAM ANNEALING [J].
CHEN, LJ ;
HUNG, LS ;
MAYER, JW ;
BAGLIN, JEE ;
NERI, JM ;
HAMMER, DA .
APPLIED PHYSICS LETTERS, 1982, 40 (07) :595-597
[4]  
FOLL F, 1981, J APPL PHYS, V52, P250, DOI 10.1063/1.328440
[5]   EPITAXIAL NISI2 FORMATION BY PULSED LASER IRRADIATION OF THIN NI LAYERS DEPOSITED ON SI SUBSTRATES [J].
GRIMALDI, MG ;
BAERI, P ;
RIMINI, E ;
CELOTTI, G .
APPLIED PHYSICS LETTERS, 1983, 43 (03) :244-246
[6]   THERMAL AND ION-INDUCED DISSOCIATION OF NISI AND NISI2 IN CONTACT WITH NICKEL [J].
HUNG, LS ;
MAYER, JW .
THIN SOLID FILMS, 1983, 109 (01) :85-92
[7]   ELECTRON-BEAM INDUCED REACTIONS IN METAL SI SYSTEMS [J].
MAJNI, G ;
NAVA, F ;
OTTAVIANI, G ;
LUCHES, A ;
NASSISI, V ;
CELOTTI, G .
VACUUM, 1982, 32 (01) :11-18
[8]  
MAYER JW, 1983, SURFACE MODIFICATION, pCH9
[9]   NISI FORMATION AT THE SILICIDE/SI INTERFACE ON THE NIPT/SI SYSTEM [J].
OTTAVIANI, G ;
TU, KN ;
CHU, WK ;
HUNG, LS ;
MAYER, JW .
JOURNAL OF APPLIED PHYSICS, 1982, 53 (07) :4903-4906
[10]   LASER-INDUCED REACTIONS OF PLATINUM AND OTHER METAL-FILMS WITH SILICON [J].
POATE, JM ;
LEAMY, HJ ;
SHENG, TT ;
CELLER, GK .
APPLIED PHYSICS LETTERS, 1978, 33 (11) :918-920
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