ELECTRON-BEAM INTERACTION WITH SUBSTRATE IN ELECTRON-BEAM LITHOGRAPHY - A SCALING EXPERIMENT TO TEST TRANSPORT-THEORY

被引：4

作者：

SCHMORANZER, H

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1988年 / 6卷 / 06期

关键词：

D O I：

10.1116/1.584110

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：2053 / 2056

页数：4

共 10 条

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[4]

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[5] BEAM ENERGY EFFECTS IN ELECTRON-BEAM LITHOGRAPHY - THE RANGE AND INTENSITY OF BACKSCATTERED EXPOSURE [J].

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[8]

SCHMORANZER H, 1986, ELECTRON MICROS, V1, P755

[9]

SCHMORANZER H, 1975, APPL PHYS LETT, V2, P483

[10]

SCHMORANZER H, 1976, ELECTRON MICROS, V1, P293

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