HIGHLY SENSITIVE NOVOLAK-BASED X-RAY POSITIVE RESIST

被引：10

作者：

LINGNAU, J

DAMMEL, R

THEIS, J

机构：

来源：

POLYMER ENGINEERING AND SCIENCE | 1989年 / 29卷 / 13期

关键词：

D O I：

10.1002/pen.760291309

中图分类号：

TQ [化学工业];

学科分类号：

0817 ;

摘要：

引用

页码：874 / 877

页数：4

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