OXYGEN PROCESSED FIELD-EMISSION TIPS FOR MICROCOLUMN APPLICATIONS

被引：32

作者：

KIM, HS

YU, ML

STAUFER, U

MURAY, LP

KERN, DP

CHANG, THP

机构：

[1] UNIV BASEL,INST PHYS,CH-4056 BASEL,SWITZERLAND

[2] LAWRENCE BERKELEY LAB,BERKELEY,CA 94720

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1993年 / 11卷 / 06期

关键词：

D O I：

10.1116/1.586981

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

An oxygen induced sharpening process of field emitter tips, W[111], for use in a scanning tunneling microscope aligned field emission microcolumn system has been developed. The sharpening process which depends on processing temperature and oxygen pressure can be used to control tip radius accurately with reliability and reproducibility. The measured tungsten removal rate was approximately 13 angstrom/min at a processing temperature of congruent-to 1650 K and at an oxygen pressure of congruent-to 4 X 10(-5) Torr. The process is primarily intended for more accurate control of the tip radius and hence performance of newly etched tips, although damaged or blunt tips can also be resharpened in situ with this process. Favorable emission characteristics of the oxygen processed tips have been observed with microcolumn operation: (1) reasonably stable emission current, (2) low extraction voltage, (3) reproducible threefold symmetric emission patterns, and (4) small emission angle.

引用

页码：2327 / 2331

页数：5