CONTROL OF A SELF-ALIGNED W-SILICIDE PROCESS BY ANNEALING AMBIENCE

被引:1
|
作者
TORRES, J [1 ]
PALLEAU, J [1 ]
BOURHILA, N [1 ]
OBERLIN, JC [1 ]
DENEUVILLE, A [1 ]
BENYAHIA, M [1 ]
机构
[1] CNRS,F-38042 GRENOBLE,FRANCE
来源
JOURNAL DE PHYSIQUE | 1988年 / 49卷 / C-4期
关键词
D O I
10.1051/jphyscol:1988437
中图分类号
学科分类号
摘要
引用
收藏
页码:183 / 186
页数:4
相关论文
共 50 条
  • [41] Formation of nickel self-aligned silicide by using cyclic deposition method
    Terashima, K
    Miura, Y
    Ikarashi, N
    Oshida, M
    Manabe, K
    Yoshihara, T
    Tanaka, M
    Wakabayashi, H
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2005, 44 (4B): : 2235 - 2239
  • [42] APPLICATION OF TUNGSTEN SILICIDE SELF-ALIGNED GATE TO GAAS-FETS
    KAO, JC
    WU, OKT
    SWANSON, A
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1985, 132 (06) : C221 - C221
  • [43] Self-Aligned Titanium Silicide NMOS and 12-Bit Multiplier
    Zhang Dingkang
    Journal of Systems Engineering and Electronics, 1992, (04) : 19 - 20
  • [44] Ni silicide and Ni germanosilicide self-aligned process for 65nm and beyond CMOS technology by 2-step rapid thermal annealing
    Mo, HX
    Bonfanti, P
    Zhu, B
    Gao, D
    Wu, HM
    Chen, J
    Wu, HZ
    Jiang, YL
    Rú, GP
    Chen, F
    2004: 7TH INTERNATIONAL CONFERENCE ON SOLID-STATE AND INTEGRATED CIRCUITS TECHNOLOGY, VOLS 1- 3, PROCEEDINGS, 2004, : 464 - 467
  • [45] W/TI SELF-ALIGNED SILICIDATION PROCESS FOR 0.25-MU-M CMOS
    INOUE, K
    FUJII, K
    MIKAGI, K
    KIKKAWA, T
    NEC RESEARCH & DEVELOPMENT, 1995, 36 (01): : 114 - 121
  • [46] Self-aligned process for single electron transistors
    Berg, EW
    Pang, SW
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2001, 19 (05): : 1925 - 1930
  • [47] A NOVEL SELF-ALIGNED ISOLATION PROCESS FOR VLSI
    CHEN, JYT
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 1983, 30 (11) : 1521 - 1527
  • [48] Self-aligned Process for SiC Power Devices
    Borsa, Tomoko
    Van Zeghbroeck, Bart
    B - SILICON CARBIDE 2010-MATERIALS, PROCESSING AND DEVICES, 2010, 1246
  • [49] Self-aligned block oxide process for bSPIFETs
    Lin, Jyi-Tsong
    Eng, Yi-Chuen
    2007 INTERNATIONAL SYMPOSIUM ON INTEGRATED CIRCUITS, VOLS 1 AND 2, 2007, : 248 - 251
  • [50] A self-aligned air gap interconnect process
    Chen, Hsien-Wei
    Jeng, Shin-Puu
    Tsai, Hao-Yi
    Liu, Yu-Wen
    Yu, C. H.
    Sun, Y. C.
    PROCEEDINGS OF THE IEEE 2008 INTERNATIONAL INTERCONNECT TECHNOLOGY CONFERENCE, 2008, : 34 - 36